Name: Park FX40 IR Campaign
Brand: Park Systems
Availability: InStoreOnly

Park FX40 IR

The non-contact AFM for small-sample chemical imaging

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Key Features

Park FX40 IR is Park Systems’ advanced AFM solution for nanoscale infrared spectroscopy and imaging, combining chemical and surface characterization on the proven FX40 platform. With low noise, minimal thermal drift, and enhanced mechanical stability, it delivers precise and reliable measurements.

Built on Photo-induced Force Microscopy (PiFM), the FX40 IR integrates an orthogonal scan system, True Non-contact™ mode, and automation features including automatic probe exchange, IR beam alignment, and multi-point measurement to ensure consistent, non-invasive operation and streamlined workflows for precise nanoscale chemical characterization.

Reliable Nano-IR Analysis

3D perspective view of Park Systems’ Nano-IR technology illustrating advanced nanoscale infrared analysis.

Automated Nano-IR Measurements

Built on the proven FX platform, Park FX40 IR automates probe exchange, laser alignment, and IR optimization.

Park SmartScan automatically optimizes the IR beam position for precise and efficient Nano-IR measurements.

Automatic IR Beam Alignment

SmartScan™ automatically finds the optimal IR beam position using real-time PiFM signal feedback.

True Non-Contact™ Nano-IR

Park FX40 IR performs fully non-contact IR measurements to prevent sample damage and tip contamination.

Illustration of nano-IR measurement using an IR laser and AFM tip to analyze surface and bulk properties.

Selectable Detection Modes

Direct and Sideband modes enable flexible nano-IR measurements, from strong signals to localized chemical contrast.

Park Advanced AFM Technology

Photo-induced Force Microscopy

Photo-induced Force Microscopy (PiFM) detects photo-induced forces generated by resonant molecular vibrations excited with a tunable IR laser. In Park FX40 IR, the AFM cantilever operates in Non-contact™ mode to measure local IR absorption without touching the sample, enabling spectral and chemical mapping with sub-5 nm spatial resolution and monolayer sensitivity.

Applications

Ps-b-PMMA Block Copolymer

Uncover phase-separated polymer domains through simultaneous chemical and morphological contrast at the nanoscale.

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Teflon Defect on SiO₂

Identify Teflon defects on SiO₂ with simultaneous nanoscale topography, chemical imaging, and IR spectral confirmation.

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e-Beam Damage on ArF Photo Resist

Uncover e-beam-induced damage in ArF photoresist through simultaneous morphological and chemical contrast at the nanoscale.

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SiO₂/Si Patterns

Reveal material-specific contrast in SiO₂/Si patterns through selective IR response and nanoscale topography.

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Case Study

Proven in the Field: Pusan National University

From semiconductor defect analysis to polymer characterization, Park nano-IR spectrometers power real-world nanoscale workflows with chemical specificity beyond conventional AFM imaging.

This capability is further demonstrated through peer-reviewed research from Pusan National University, including work published in Advanced Energy Materials.

* DOI: 10.1002/aenm.202506521

Case Study Research Paper

Researcher operating a Park Systems Nano-IR instrument at Pusan National University with a featured published research article.

Flexible Upgrade Path

Future-Ready, On Your Timeline

Start with the FX40 (IR-upgradeable system) first, then expand to nano-IR capabilities later without changing platforms. A flexible upgrade path designed to adapt to evolving research priorities and investment plans.

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