Park FX200 IR is Park Systems’ advanced AFM solution for nanoscale infrared spectroscopy and imaging, combining chemical and surface characterization. It is built on the proven FX200 platform supporting samples up to 200 mm, with low noise, minimal thermal drift, and high mechanical stability, ensuring reliable high-resolution metrology.
FX200 IR supports Photo-induced Force Microscopy (PiFM), enabling both IR spectral analysis and chemical imaging at the nanoscale. Like all Park AFMs, it features an orthogonal scan system and True Non-contact™ mode, delivering consistent, non-invasive measurements even on fragile samples.
Automation features such as automatic probe exchange, IR beam alignment, a full 200 mm sample-view camera, and multi-point measurement streamline operation and simplify workflows.
Key Features
By combining high-performance AFM with advanced IR capability, FX200 IR provides a powerful platform for precise and efficient nanoscale chemical characterization. Since the FX200 IR combines the Park FX200 and Park nano-IR spectrometers, explore each product’s core features on dedicated pages.
Photo-induced Force Microscopy (PiFM) detects photo-induced forces generated by resonant molecular vibrations excited with a tunable IR laser. In Park FX200 IR, the AFM cantilever operates in Non-contact™ mode to measure local IR absorption without touching the sample, enabling spectral and chemical mapping with sub-5 nm spatial resolution and monolayer sensitivity.
From semiconductor defect analysis to polymer characterization, Park FX200 IR enables real-world nanoscale workflows with chemical specificity beyond conventional AFM imaging. Its capabilities are demonstrated through peer-reviewed research from Pusan National University, including work published in Advanced Energy Materials.