Advancements in 2D Materials' Characterization via Imaging Spectroscopic Ellipsometry (ISE)

ISE Webinar Series 2025

Imaging Spectroscopic Ellipsometry (ISE) is an all-optical, non-contact metrology technique that excels at the layer-thickness and material characterization of micro-structured thin-film samples and substrates. The technique combines the benefits of ellipsometry and optical microscopy in a single device and offers enhanced spatial resolution expanding ellipsometry into new areas of microanalysis, microelectronics, and bio analytics.

In this webinar series, we show the benefits of ISE in the field of 2D materials characterization, in which it enables the determination of optical properties. This data is required for a better understanding of 2D material based devices.

FX40 with monitor

Tuesday, May 6th

Spectroscopic Imaging Ellipsometry at Cryogenic Temperatures Applied to Atomically Thin Crystals

7 AM PDT I 10 AM EDT I 4 PM CEST

Speaker: Prof. Dr. Ursula Wurstbauer, University of Münster, Germany

FX40 with monitor

Thursday, June 26th

Giant Optical Anisotropy and High Refractive Index in van der Waals Materials

9 AM CEST I 3 PM SGT I 4 PM JST

Speaker: Georgy Ermolaev, XPANCEO, United Arab Emirates

FX40 with monitor

Thursday, October 23th

Imaging Müller Matrix Ellipsometry for Quantifying Dielectric Tensors of Molecular Microcrystals as well as Analyzing Engineered Microstructures

10 AM CEST I 4 PM SGT I 5 PM JST

Speaker: Prof. Dr. Manuela Schiek, University of Linz, Austria

FX40 with monitor

Thursday, November 20th

Deeper insights into 2D-Materials and related Microcrystals by Imaging Spectroscopic Ellipsometry (ISE) and Imaging Mueller Matrix Ellipsometry (IMME)

7 AM CEST I 3 PM SGT I 4 PM JST

Speaker: Dr. Peter H. Thiesen, Park Systems GmbH, Accurion Division

Related Application notes:
FX40 with monitor

Application Note

Investigation of optical and electronic properties of trapped bubbles in vdW heterostructures based on combined ISE and AFM techniques



FX40 with monitor

Application Note

Full Scale Wafer Analysis by Imaging Ellipsometry and Ellipsometric Contrast Micrography (ECM)