Imaging Müller Matrix Ellipsometry for Quantifying Dielectric Tensors of Molecular Microcrystals as well as Analyzing Engineered Microstructures
SPEAKERS
  • Prof. Dr. Manuela Schiek
    University of Linz, Austria
Authors
Prof. Dr. Manuela Schiek

Imaging Mueller matrix ellipsometry (IMME) provides powerful capabilities for spatially resolved optical characterization across a wide range of sample types. Here, the application for two distinct fields is demonstrated: the analysis of molecular excitons in microcrystalline thin films and the optical probing of engineered micro-/nano-structures fabricated by lithography.
A particular anilino squaraine dye forms microcrystalline textured thin films exhibiting rotational domains with a preferred orientation. Using an EP4 imaging ellipsometer, the full diagonal dielectric tensor of these domains can be determined,[1] revealing a multiple Davydov splitting including a dark state due to multiple non-equivalent molecules within the orthorhombic unit cell. Once the molecular alignment and the spatial anisotropy of the excitonic transitions are known polarized spectroscopic transmission intensity mapping with the EP4 enables the identification of different polymorphs in distinct crystalline domains based on their characteristic polarized absorbance pattern [2].
In a complementary study, the performance of an EP4 system is demonstrated for single tapered gold lines fabricated on silicon substrates. Despite being below the diffraction limit, individual lines with a diameter of about 50 nm are clearly detected through Psi-Delta imaging. Moreover, Mueller matrix imaging reveals significant off-diagonal signals at the edges of structures a few microns wide, effects that would be lost in conventional non-imaging ellipsometry. [3,4]
These examples illustrate the versatility of imaging Mueller matrix ellipsometry for both the quantification of dielectric tensors in microcrystals and the extended optical characterization of engineered micro-/nano-structures.

 

Matrix_Imaging_of_Microstructures.JPG

Image taken from [1]: https://pubs.acs.org/cms/10.1021/acs.jpclett.1c00317/asset/images/medium/jz1c00317_0004.gif 

 

 

References:
[1] Funke, Duwe, Balzer, Thiesen, Hingerl, Schiek. Determining the Dielectric Tensor of Microtextured Organic Thin Films by Imaging Mueller Matrix Ellipsometry. J. Phys. Chem. Lett. 12 (2021) 3053.
[2] Balzer, Breuer, Witte, Schiek. Template and Temperature-Controlled Polymorph Formation in Squaraine Thin Films. Langmuir 38 (2022) 9266.
[3] Hingerl. Imaging Ellipsometry for Structured and Plasmonic Materials. J. Appl. Phys. 129 (2021) 113101.
[4] Käseberg, Grundmann, Siefke, Klapetek, Valtr, Kroker, Bodermann. Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures. Front. Phys. 9 (2021) 814559.