Webinars

Imaging Spectroscopic Ellipsometers (ISE) combine the benefits of ellipsometry and optical microscopy in a single device. The unification of the two technologies creates a unique metrology tool that redefines the limits of both ellipsometric measurements and polarization-contrast microscopy. The enhanced spatial resolution of imaging ellipsometers expands ellipsometry into new areas of microanalysis, microelectronics, and bio analytics. Imaging Ellipsometry is an all-optical, non-contact metrology technique that excels at the layer-thickness and material characterization of micro-structured thin-film samples and substrates.
In the field of 2D materials characterization, Imaging Spectroscopic Ellipsometry enable the determination of optical properties [1],[2],[3].. The data are required for a better understanding of 2D material based devices [4],[5]..
From the macroscopic point of view, ellipsometric contrast micrographs or microscopic maps of Delta and Psi can be stitched and offer a fast, non-contact, wafer-scale, atomic layer resolved imaging of 2D materials [6] on a variety of substrates. Including maps recorded at different wavelengths, a specific search for microcrystals with a dedicated number of layers or a predefined thickness was reported. Recent studies also show the possibility of imaging buried layers [7].
The focus of the talk will be on applications of Imaging Müller matrix ellipsometry for anisotropic microcrystals characterization. Micrographs of 11 elements of the Müller Matrix, normalized to element 1 were recorded at different wavelength and orientations for different microcrystals like Black Phosphorous or Bi₂SeO₅ (Fig, 1).