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    NX20 300mm
    Atomic Force Microscope
    The leading automated nanometrology tool for
    300 mm wafer measurement and analysis

Park NX20 300mm

The leading automated nanometrology tool for
300 mm wafer measurement and analysis

The Park NX20 300mm is the industry's first large sample AFM that supports a full motorized traveling range of 300 mm x 300 mm. Designed for failure analysis and quality control laboratories, the new upgraded Park NX20 system can inspect an entire 300 mm wafer efficiently, without any need for cumbersome sample displacement. Despite the enlarged platform to support the 300 mm motorized XY stage, Park's innovative vibration isolation technology keeps the system noise level below 0.5 angstrom (Å) RMS or typically 0.3 Å RMS

in the field. Proven AFM performance and SingleClick-AFM automation eliminates any need for sample adjustment and makesof Park NX20 the scanning process as efficient and user-friendly as possible. With our "Program Mode" interface users can easily implement reliable and repeatable sequential multiple-site measurements over the entire 300mm x 300mm area. This makes the NX20 300 mm the premiere choice for FA, QA, and QC engineers that need to scan large samples.

Specifically Built for Large Sample Wafer Inspection

The NX20 300 mm was designed from the ground up to allow for optimal measurements of large samples. The entire 300 mm wafer area can be analyzed for low-noise AFM measurements. This opens up a whole new scope of measurement automation, allowing engineers to work faster, more simply, and with greater precision.



Flexible 300 mm Sample Chuck

The Park NX20 300 mm’s vacuum chuck supports a wide range of wafer sizes, shapes, and types allowing users to accurately scan practically any sample.


300 mm XY stage

The motorized 300 mm XY stage allows users to move the AFM measuring position within the entire 300 mm area.




Proven NX20 Performance with a 300 mm sample stage

The NX20 is already the best choice for FA, QA, and QC engineers that need its unparalleled ease of use and automation without compromising on accuracy. With its enlarged platform that supports a 300mm motorized XY stage, the NX20 300 mm takes this a step further, allowing users to inspect larger samples easily and with extremely high accuracy.



Park SmartScan™ makes getting accurate measurements simple

The Park NX20 is equipped with our SmartScan OS, making it one of the easiest to use AFMs on the market. With an intuitive but extremely powerful interface, even untrained users can quickly scan a large sample without supervision. This lets senior engineers focus their experience on solving bigger problems and developing better solutions.





aScan multiple sites on the entire 300 mm wafer

SmartScan’s program mode allows users to take automated sequential site measurements, compare surface morphologies, height, surface roughness from site-to-site and sample-to-sample using grid and wafer based modes. This can greatly improve user-convenience and productivity when scanning large samples.

bPowerful recipe creation

Our simple recipe creation process allows engineers to set presets defined by location, name, number and type on each batch.


Optimized for a Wide Range of Applications

The NX20 300mm provides recipe-automated AFM measurement for numerous applications providing advanced measurements and analysis of samples at the nanoscale. With the ability to measure roughness, height and depth, perform defect reviews, electrical and magnetic failure analyses, thermal property characterization, and nanomechanical property imaging, the AFM is ideally suited to a wide range of tasks performed by FA, QA, and QC engineers that work with large samples.




Park NX20 300mm Specifications


Z Scanner

Flexure guided high-force scanner

Scan range : 15 µm (optional 30 µm)

XY Scanner

Single module flexure XY-scanner with dual servo closed-loop control

Scan range : 100 µm × 100 µm



Z stage range : 25 mm (Motorized)
Focus travel range : 8 mm (Motorized)
XY stage travel range : 300 mm x 300 mm (Motorized)


Sample Mount

Sample size : 100, 150, 200, 300 mm wafers, small sample Magnetic sample holder, thickness up to 20 mm


On-Axis Optics

10x (0.21 NA) ultra-long working distance lens (1 µm resolution)
Direct on-axis vision of sample surface and cantilever
Field-of-view : 840 × 630 µm (with 10× objective lens)
CCD : 5 M pixel




• AFM system control and data acquisition software
• Auto mode for quick setup and easy imaging
• Manual mode for advanced use and finer scan control


• AFM data analysis software
• Stand-alone design—can install and analyze data away from AFM
• Capable of producing 3D renders of acquired data



Integrated functions
4 channels of flexible digital lock-in amplifier
Spring constant calibration (Thermal method)
Digital Q control


(*Optionally available)

Standard Imaging

True Non-Contact
PinPoint™ AFM
Lateral Force Microscopy (LFM)
Phase Imaging

Dielectric/Piezoelectric Properties

Electric Force Microscopy (EFM)
Piezoresponse Force Microscopy (PFM)
PFM with High Voltage*
Contact Resonance PFM (CR-PFM)*

Mechanical Properties

Force Modulation Microscopy (FMM)
Nanolithography with High Voltage*



• Liquid Probehand
• Universal Liquid Cell with Temperature Control
• Temperature Controlled Stage 1, 2 and 3
• Electrochemistry Cell
• High-field Magnetic Field Generator
• Tilting Sample Chuck
• Snap-in Sample Chuck