-
Typhimurium thermal_property Sperm Kevlar plastics ThermalConductivity MechanicalProperties Titanate SetpointMode TipBiasMode Conductivity flakes BlockCopolymer KelvinProbeForceMicroscopy LifeScience Hair MLCC hard_disk GlassTemp ImideMonomer Reduction Nanostructure Piezoelectric Zhi PinpointNanomechanicalMode Au111 BiFeO3 VortexCore NCM Al2O3 Hexylthiophene 2dMaterials mfm_amplitude Transparent WWafer
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256