WS₂ Flake on Si/SiO₂ (300 nm) Substrate
Image presents high-resolution ellipsometric maps (Psi) of a Tungsten Disulfide (WS₂) microcrystal exfoliated onto a silicon substrate with a 300 nm oxide layer.
Unlike conventional intensity-based microscopy, ISE simultaneously determines the polarization states for each pixel, providing spatially resolved phase contrast. This unique capability allows for the clear visualization of distinct terraces within the flake, enabling the precise identification of mono- to multi-layer thickness variations across the microcrystal surface.
Measurement Conditions
- System: EP4
- AOI: 45°
- Wavelength: 523 nm
- Method: Delta & Psi, ISE
- Objective Lens: 5× Nikon
- Lateral Resolution: 4 μm
*Image contribution: Accurion
Application
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