Photo Resist Trench
A 29 nm-wide photoresist trench sample was measured in True Non-contact mode. The resulting topography image shows the well-defined trench structure with a peak-to-valley difference of 63.8 nm.
Scanning Conditions
- System: NX20 300mm
- Scan Mode: True Non-contact
- Scan Rate: 0.5 Hz
- Scan Size: 1 µm × 1 µm
- Pixel Size: 1024 × 256 pixels
- Peak to Valley: 63.8 nm
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