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Spectroscopic Imaging Ellipsometry With New High Speed Measurement Mode


Thickness and composition of a multi layer film need to be mapped over larger samples with high speed.


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Imaging ellipsometry with the nanofilm_ep4 combines the sensitivity for thickness and spectral refractive index measurements of ellipsometry with the benefits of magnification and lateral resolution of optical microscopy down to 1µm.



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Micro scale pattern :

Multiple regions on a sample down to 1µm are selected by the patented ROI (Region Of Interest) option.
The new RCE6 mode (rotating compensator) performs fast automated spectral measurements and mapping on micron-scale features.
Over 300000 Delta and Psi spectra (one spectrum per pixel) in less than 20s!



- Thickness-maps, composition-maps and RI-maps across larger samples
- Tact time for multi-region measurement or micro-map < 20s
- Repeatability of thickness results: 0.03nm*
*(1µmx5µm region, 115nm SiO2 on Si)




- Quality control on display panels
- Wafer level mapping on microstructures
- Inkjet micro printing