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NanoLithography rubber amplitude_modulation nanomechanical mono_layer EvatecAG Ito lithography ThinFilm Growing LMF FFM Microchannel Ca10(PO4)6(OH)2 DLaTGS Melt Hydroxyapatite Platinum OxideLayer Implant align Composition Roughness Step Pore PECurve mechanical_property TipBiasMode CastIron DeoxyribonucleicAcid BaTiO3 ScratchMode Memory C_AFM Scratch
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Tungsten coated wafer
Scanning Conditions
- System: NX10
- Scan Mode: NCM
- Cantilever: NCHR (k=42N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.3Hz
- Pixel: 512×5126