-
AlkaneFilm SRAM BlockCopolymer Sulfur CrossSection TPU Ram STO Temasek_Lab BoronNitride Potential Multiferroic_materials Hexacontane Hair OrganicSemiconductor align Chungnam_National_University India Copolymer HexagonalBN Melt Vacuum Transparent TungstenThinFilmDeposition IcelandSpar NCM dielectric trench Thermal PUR Chromium InorganicCompound Sic polymeric_arrays FastScan fluoroalkane
-
AlkaneFilm SRAM BlockCopolymer Sulfur CrossSection TPU Ram STO Temasek_Lab BoronNitride Potential Multiferroic_materials Hexacontane Hair OrganicSemiconductor align Chungnam_National_University India Copolymer HexagonalBN Melt Vacuum Transparent TungstenThinFilmDeposition IcelandSpar NCM dielectric trench Thermal PUR Chromium InorganicCompound Sic polymeric_arrays FastScan fluoroalkane