e-Beam Damage on ArF Photo Resist

e-Beam_Damage_ArF_Photo_Resist.JPG

This slide shows e-beam damage on ArF photoresist.
The AFM topography image reveals surface modifications caused by e-beam exposure.
The PiFM image highlights compositional changes in the exposed regions, clearly distinguishing them from the unaffected areas.

Scanning Conditions

- System: Nano-IR
- Sample: Sample: PR pattern sample
- Scan Mode: PiFM (Channel: Z Height, PiFM Amplitude)
- Scan Rate: 1 Hz
- Scan Size: 1 µm × 1 µm
- Pixel Size: 512 × 256 pixels

Application

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Related Modes

Photoinduced Force Microscopy (PiFM)

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