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NeodymiumMagnets Step Thermal molecular_self_assembly SmalScan Melt SiliconCrystal Layer HexacontaneFilm Electrical&Electronics vertical_PFM PANI small_scan Fujian AEAPDES ContactModeDots MoS2 MoirePattern OrganicCompound Vortex SiliconeOxide dielectric trench Sperm Bismuth BTO Yeditepe_University Conduct Co/Cr/Pt Ananth Pipette Iron BismuthVanadate ThermalProperties OxideLayer atomic_steps
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Lithography on Si substrate
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: ContscPt (k=0.2N/m, f=25kHz)
- Scan Size: 10μm×10μm
- Scan Rate: 1Hz
- Pixel: 1024×512
- Litho. mode: Tip bias mode
- Litho. Tip bias: Black -10V, White 0V