在先进半导体制程领域中,光刻技术扮演着极其重要且关键的角色。其中,光掩模作为微缩图形的来源,如何确保其图形正确而不被缺陷所影响,缺陷检测与修复成了光掩模不可或缺的工序。文中介绍原子力显微镜作为高精度纳米级定位与量测系统,可用来针对光掩模上的缺陷形貌、尺寸大小、定位缺陷位置与种类做进一步检验 (Defect Review),并生成三维形貌和其他关键性的计量数据,亦可作为电子束或是激光修补机台的定期机况监控,给予及时的制程条件反馈。
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