ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
Application
Related Modes
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