-
mono_layer PolyvinylideneFluoride HiVacuum HighAspect AdhesionEnergy polymeric_arrays NtuEee Annealing MonoLayer Tungsten_disulfide TransitionMetal single_layer AtomicLayer rubber HumanHair Molybdenum_disulfide DNA IcelandSpar PolyStylene domain_switching ito_film BismuthFerrite HydroGel Ca10(PO4)6(OH)2 GlassTemperature Imprint Silicon Vortex MoS2 LaAlO3 Bismuth SrTiO3 Hexylthiophene Optical HighAcpectRatio
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Lithography on Si substrate
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: ContscPt (k=0.2N/m, f=25kHz)
- Scan Size: 10μm×10μm
- Scan Rate: 1Hz
- Pixel: 1024×512
- Litho. mode: Tip bias mode
- Litho. Tip bias: Black -10V, White 0V