Park NX20 300mm
The leading automated nanometrology tool for
300 mm wafer measurement and analysis
The Park NX20 300mm is the industry's first large sample AFM that supports a full motorized traveling range of 300 mm x 300 mm. Designed for failure analysis and quality control laboratories, the new upgraded Park NX20 system can inspect an entire 300 mm wafer efficiently, without any need for cumbersome sample displacement. Despite the enlarged platform to support the 300 mm motorized XY stage, Park's innovative vibration isolation technology keeps the system noise level below 0.5 angstrom (Å) RMS or typically 0.3 Å RMS
Specifically Built for Large Sample Wafer Inspection
The NX20 300 mm was designed from the ground up to allow for optimal measurements of large samples. The entire 300 mm wafer area can be analyzed for low-noise AFM measurements. This opens up a whole new scope of measurement automation, allowing engineers to work faster, more simply, and with greater precision.

Flexible 300 mm Sample Chuck
The Park NX20 300 mm’s vacuum chuck supports a wide range of wafer sizes, shapes, and types allowing users to accurately scan practically any sample.
300 mm XY stage
The motorized 300 mm XY stage allows users to move the AFM measuring position within the entire 300 mm area.

Proven NX20 Performance with a 300 mm sample stage
The NX20 is already the best choice for FA, QA, and QC engineers that need its unparalleled ease of use and automation without compromising on accuracy. With its enlarged platform that supports a 300mm motorized XY stage, the NX20 300 mm takes this a step further, allowing users to inspect larger samples easily and with extremely high accuracy.
Park SmartScan™ makes getting accurate measurements simple
The Park NX20 is equipped with our SmartScan OS, making it one of the easiest to use AFMs on the market. With an intuitive but extremely powerful interface, even untrained users can quickly scan a large sample without supervision. This lets senior engineers focus their experience on solving bigger problems and developing better solutions.

aScan multiple sites on the entire 300 mm wafer
SmartScan’s program mode allows users to take automated sequential site measurements, compare surface morphologies, height, surface roughness from site-to-site and sample-to-sample using grid and wafer based modes. This can greatly improve user-convenience and productivity when scanning large samples.
bPowerful recipe creation
Our simple recipe creation process allows engineers to set presets defined by location, name, number and type on each batch.
Optimized for a Wide Range of Applications
The NX20 300mm provides recipe-automated AFM measurement for numerous applications providing advanced measurements and analysis of samples at the nanoscale. With the ability to measure roughness, height and depth, perform defect reviews, electrical and magnetic failure analyses, thermal property characterization, and nanomechanical property imaging, the AFM is ideally suited to a wide range of tasks performed by FA, QA, and QC engineers that work with large samples.
Park NX20 300mm Specifications
Scanner
Z Scanner
Guided high-force flexure scanner
Scan range : 15 µm (optional 30 µm)
Height noise level : 30 pm
0.5 kHz bandwidth, rms (typical)
XY Scanner
Single module flexure XY-scanner with dual servo closed-loop control
Scan range : 100 µm × 100 µm
Stage
Z stage range : 25 mm (Motorized)
Focus travel range : 8 mm (Motorized)
XY stage travel range : 300 mm x 300 mm (Motorized)
Sample Mount
Sample size : 100, 150, 200, 300 mm wafers, small sample Magnetic sample holder, thickness up to 20 mm
Sample weight : < 500 g
Optics
10x (0.23 NA) ultra-long working distance lens (1 µm resolution)
Direct on-axis vision of sample surface and cantilever
Field-of-view : 840 × 630 µm (with 10× objective lens)
CCD : 5 M pixel
Software
SmartScan™
Dedicated system control and data acquisition software
Auto mode, Manual mode
Program mode for recipe-automated, sequential multiple-site measurement AFM operation
XEI
AFM data analysis software
Electronics
Integrated functions
4 channels of flexible digital lock-in amplifier
Digital Q control
Signal processing
- ADC : 18 channels 4 high-speed ADC channels 24-bit ADCs for X, Y and Z scanner position sensor
- DAC : 17 channels 2 high-speed DAC channels 20-bit DACs for X, Y and Z scanner positioning
- Maximum data size : 4096 x 4096 pixels
External signal access
20 embedded signal input/output ports
5 TTL outputs : EOF, EOL, EOP, Modulation, and AC bias
AFM Modes
(*Optionally available)
Standard Imaging
True Non-Contact AFM
PinPoint™ AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Tapping AFM
Force Measurement
Force Distance (F/d) Spectroscopy
Force Volume Imaging
Dielectric/Piezoelectric Properties
Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoresponse Force Microscopy (PFM)
PFM with High Voltage*
Mechanical Properties
Force Modulation Microscopy (FMM)
Nanoindentation*
Nanolithography*
Nanolithography with High Voltage*
Nanomanipulation*
Magnetic Properties*
Magnetic Force Microscopy (MFM)
Tunable Magnetic Field MFM
Electrical Properties
Conductive AFM (C-AFM)*
IV Spectroscopy*
Kelvin Probe Force Microscopy (KPFM)
Scanning Capacitance Microscopy (SCM)*
Scanning Spreading-Resistance Microscopy (SSRM)*
Scanning Tunneling Microscopy (STM)*
Photo Current Mapping (PCM)*
Chemical Properties*
Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-AFM)
AFM Options
Customize your AFM to handle any project
Active Temperature Controlled Acoustic Enclosure
Innovative control design allows Park NX20 300mm to quickly reach temperature equilibrium Park NX20 300mm also features active vibration isolation.
Innovative control design allows Park NX20 300mm to quickly reach temperature equilibrium Park NX20 300mm also features active vibration isolation.
Encoders for Motorized Stage
• The encoded XY stage travels in 1 µm resolution with 2 µm repeatability
• The encoded Z stage travels in 0.1 µm resolution with 1 µm repeatability
• Dedicated small sample holder for electrical measurements
• Vacuum grooves to hold wafers
Temperature Control
· Temperature Controlled Stage 1: -25 °C to +170 °C
· Temperature Controlled Stage 2: Ambient to +250 °C
· Temperature Controlled Stage 3: Ambient to +600 °C