-
Wildtype Bismuth CrossSection Sidewall AM_KPFM molecule DLaTGS HighAcpectRatio TCS HiVacuum NCM\ Polyimide gallium_nitride #EC ScanningThermalMicroscopy Sapphire OrganicSemiconductor dielectric_trench GaN margarine molecular_self_assembly Etch SrTiO3 NiFe PatternedSapphireSubstrat Mechinical HexacontaneFilm PiezoelectricForceMicroscopy ContactModeDot LateralForceMicroscopy Plug oxide_layer OpticalWaveguide LogAmplifier ConductingPolymer
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)