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Christmas Ball Lithography on Si

Christmas Ball Lithography on Si

Create oxidation layers on bare Si surface using bias mode of lithography.

Scanning Conditions

- System: NX10
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area

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