| Contact Us   Global

The only wafer fab AFM with automatic defect review

Low Noise, High Throughput Atomic Force Profiler

Park NX-Wafer is the industry’s leading automated AFM metrology system for semiconductor and related fabrications. It provides wafer fab inspection and analysis, automatic defect review for bare wafers and substrates, and CMP profile measurements. Park NX-Wafer has the highest nanoscale surface resolution with sub-angstrom height accuracy, scan after scan with negligible tip to tip variation and preserved tip sharpness unmatched by others.
Park NX-Wafer with its automated system features including auto tip exchanger, live monitoring, target positioning without reference marks and auto analysis makes the best semiconductor AFM tool in the industry.

Park NX-Wafer

Park NX-Wafer

  • Low noise atomic force profiler for more accurate CMP profile measurements
  • Sub-Angstrom surface roughness measurements with extreme accuracy and negligible tip-to-tip variation
  • Fully automated AFM solution for defect imaging and analysis
  • A fully automated system with auto tip exchange, robot wafer handler
  • Capable of scanning 300 mm wafers
Request for Quote
 

Park NX-Wafer Operation Video

 

Productivity meets Accuracy

Automatic Tip Exchange (ATX)

The ATX automatically locates tips by pattern recognition and uses a novel magnetic approach to disengage a used tip and pick up a new tip, with an incredible 99.9% success rate. The laser spot is then automatically optimized along the X- and Y-axis by motorized positioning knobs.

Automatic-Tip-Exchange

Ionization System for a more stable scanning environment

Our innovative ionization system quickly and effectively removes electrostatic charges in your sample's environment. Since the system always generates and maintains the ideal balance of positive and negative ions, it can create an extremely stable charge environment with little contamination of the surrounding area and minimal risk of accidental electrostatic charge during sample handling.

NX-HDM Ionization-System

Automatic Wafer Handler (EFEM or FOUP)

The NX-WAFER can be configured for various automatic wafer handlers (EFEM or FOUP or other). The high-precision, nondestructive wafer handler robot arm fully ensures users always get fast and reliable wafer measurements.

 

Automatic-Wafer-Handler
 
 

Park NX-Wafer Specifications

System
Specification

Motorized XY stage

200mm : travels up to 300 mm × 200 mm, 0.5 µm resolution

300mm : travels up to 400 mm × 300 mm, 0.5 µm resolution


Motorized Z stage

25 mm Z travel distance,
0.08 µm resolution

Motorized Focus Stage

9 mm Z travel distance for on-axis optics


Sample Thickness Allowance

up to 20 mm

 

Scanner Performances

XY Scanner

100 µm × 100 µm (Large mode)

Z Scanner Range

15 µm (Large mode)
2 µm (Small mode)

 

AFM and XY Stage
Control Electronics

ADC

18 channels
4 high-speed ADC channels
24-bit ADCs for X,Y and Z scanner position sensor

 

DAC

17 channels
2 high-speed DAC channels
20-bit DACs for X,Y and Z scanner positioning

 

Compliances

CE

SEMI Standard S2/S8

 

Vibration, Acoustic Noise, and ESD Performances

Floor Vibration

< 0.5 µm/s (10 Hz to 200 Hz w/ Active Vibration Isolation System)

Acoustic Noise

>20 dB attenuation w/ Acoustic Enclosure

 

Facility Requirements

Room Temperature (Stand By)

10 °C ~ 40 °C 


Room Temperature (Operating)

18 °C ~ 24 °C


Humidity

30% to 60% (not condensing)


Floor Vibration Level

VC-D (6µm/sec)


Acoustic Noise

Below 65 dB

Pneumatics

Vacuum : -80 kPa
CDA (or N2): 0.7 MPa


Power Supply Rating

208V - 240 V, single phase, 15 A (max)


Total Power Consumption

2 KW (typical)


Ground Resistance

Below 100 ohms

 

Options

Long Range Sliding Stage

• 200mm : 10 mm (optional 25 mm)
• 300mm : 25 mm (optional 10 mm or 50 mm)

 

Automatic Tip Exchange (ATX)

Automatic Tip Exchange performs fully automated tip exchanges in order to seamlessly continue automated measurement routines. It automatically calibrates cantilever location and optimizes measurement settings based on measurements of a reference pattern. Our novel magnetic approach to the tip exchange yields a 99% success rate, higher than the traditional vacuum techniques.

 

Automatic Wafer Handler (EFEM or FOUP)

The XE-3DM can be further customized by adding an automatic wafer handler (EFEM or FOUP or other). The high-precision, nondestructive wafer handler robot arm fully ensures XE-3DM users to receive fast and reliable wafer measurement automation.

 

Ionization System

Ionization system effectively removes electrostatic charges. It ionizes the charged objects and is very reliable since the system always generates and maintains an ideal balance of positive and negative ions without causing any contamination to the surrounding area. It also reduces the accidental electrostatic built-in charge that may occur during sample handling.

 

Dimensions & Weight

200 mm System

2732 mm(w) × 1100 mm(d) x 2400 mm(h)
w/ EFEM, 2110 kg approx. (incl. Control Cabinet)


Ceiling Height

3000 mm or more


Operator Working Space

3300 mm (w) x 1950 mm (d), Minimum

300 mm System

3486 mm(w) × 1450 mm(d) x 2400 mm(h)
w/ EFEM, 2950 kg approx. (incl. Control Cabinet)


Ceiling Height

3000 mm or more


Operator Working Space

4770 mm (w) x 3050 mm (d), Minimum

 
footprint-300mm-wafer[ Park NX-Wafer 300mm installation layout ]
 

 

The only wafer fab AFM with automatic defect review

Low Noise, High Throughput Atomic Force Profiler

Park NX-Wafer is the industry’s leading automated AFM metrology system for semiconductor and related fabrications. It provides wafer fab inspection and analysis, automatic defect review for bare wafers and substrates, and CMP profile measurements. Park NX-Wafer has the highest nanoscale surface resolution with sub-angstrom height accuracy, scan after scan with negligible tip to tip variation and preserved tip sharpness unmatched by others.
Park NX-Wafer with its automated system features including auto tip exchanger, live monitoring, target positioning without reference marks and auto analysis makes the best semiconductor AFM tool in the industry.

  • Low noise atomic force profiler for more accurate CMP profile measurements
  • Sub-Angstrom surface roughness measurements with extreme accuracy and negligible tip-to-tip variation
  • Fully automated AFM solution for defect imaging and analysis
  • A fully automated system with auto tip exchange, robot wafer handler
  • Capable of scanning 300 mm wafers