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The economical choice for innovative research

Park XE7 has all the state-of-the-art technology you've come to expect from Park Systems, at a price your lab can afford. Designed with the same attention to detail as our more advanced models, the XE7 allows you to do your research on time and within budget.

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Uncompromised High Performance

Park XE7 provides accurate measurement at highest nanoscale resolution than any other products in its class.It allows you to obtain sample images and its characteristic measurements true to its nano structure thanks to its flat, orthogonal, and linear scan measurements by its unique AFM architecture: independent XY and Z, flexure based scans. Furthermore, Park's unique True Non-Contact™ mode provides you with the sharpest images, scan after scan without declining resolution.

For Current and Future Needs

Park XE7 empowers you to innovate now and in the future. It gives you ready access to the largest number of measurement modes in the industry. You can employ any of these modes now, and in the future to support your evolving needs. What's more, the XE7 has the most open access design in the market that allows you to integrate and combine accessories and instruments to tailor it to your unique research requirements.

Easy to Use and High Productivity

Park XE7 together with its intuitive graphical user interface, and its automated tools, allows even novice users get from sample placement to scan results, fast. Starting from pre-aligned tip mount, easy sample and tip exchange, simple laser alignment, on-axis top-down optical viewing, to user friendly scan controls and software processing, the XE7 provides highest research productivity in AFM.

Economical Beyond the System Cost

Not only is Park XE7 the most affordable as a research grade AFM, it is also the most economical in total cost of ownership. Park's True Non-Contact™ mode technology found in the XE7 allows users to save money on costly probe tips. Moreover, Park XE7 offers you much longer product life and upgradeability as a result of its compatibility with the most extensive types of modes and options available in the industry.


The Most Extensible AFM Solution

Supports Park’s most extensive range of SPM modes and options in the industry

Today's researchers need to characterize a wide range of physical properties under diverse measurement conditions and sample environments. Park Systems provides the most extensive range of SPM modes, the largest number of AFM options, and the best option compatibility and upgradeability in the industry for advanced sample characterization.graphene-topography-spm-modes

Park XE7 has the most extensive range of SPM modes (*Optionally available)


Accurate XY Scan by Crosstalk Elimination

Park Systems’ advanced Crosstalk Elimination (XE) scan system effectively addresses all of the above-mentioned problems. In this configuration, we used a 2-dimentional flexure stage to scan the sample in only the XY direction, and a stacked piezoelectric actuator to scan the probe cantilever in the Z direction only. The flexure stage used for the XY scanner is made of solid aluminum. It demonstrates high orthogonality and an excellent out-of-plane motion profile. The flexure stage can scan large samples (~1 kg) up to a few 100 Hz in the XY direction. This scan speed is sufficient because the bandwidth requirement for the XY axes is much lower than that for the Z axis. The stacked piezoelectric actuator for the Z-scanner has a high resonance frequency (~10 kHz) with a high pushpull force when appropriately pre-loaded.

XE scan system

  • independent, loop XY and Z flexure scanners for sample and probe tip

XY flexure scanner

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  • Flat and orthogonal XY scan with low residual bow


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Figure 9. Zero background curvature by Park Systems XE-system (a) and typical background curvature of a conventional AFM system with a tube scanner (b). (c) shows the cross section of these background curvatures.

Figure 9. shows unprocessed AFM images of a bare silicon wafer taken with the XE-system (a), and with a conventional AFM (b). Since the silicon wafer is atomically flat, most of the curvatures in the image are scanner-induced artifacts. Figure 9. (c) shows the cross section of the images in Figure 9. (a) and (b). Since the tube scanner has intrinsic background curvatures, the maximum out-of-plane motion is as much as 80 nm when the X-axis moves 15 μm. The XE scan system has less than 1nm of out-of-plane motion for the same scan range. Another advantage of the XE scan system is its Z-servo response.

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Figure 10. Figure 11.

Figure 10. is an image of a porous polymer sphere (Styrene Divinyl Benzene), whose diameter is about 5 µm, taken with the XE-system in Non-Contact mode. Since the Z-servo response of the XE-system is very accurate, the probe can precisely follow the steep curvature of the polymer sphere as well as small porous surface structures without crashing or sticking to the surface. Figure 11. shows another example that demonstrates the high performance of the z-servo response with a flat background.


Best Life, by True Non-Contact™ Mode

In True Non-Contact™ Mode, the tip-sample distance is successfully maintained at a few nanometers in the net attractive regime of inter-atomic force. The small amplitude of tip oscillation minimizes the tip-sample interaction, resulting in superb tip preservation and negligible sample modification.

True Non-Contact™ Mode

  • Less tip wear = Prolonged high-resolution scan
  • Non-destructive tip-sample interaction = Minimized sample modification
  • Immunity from parameter dependent results

Tapping Imaging

  • Quick tip wear = Blurred low-resolution scan
  • Destructive tip-sample interaction = Sample damage and modification
  • Highly parameter-dependent

Longer Tip Life and Less Sample Damage

The sharp end of an AFM tip is so brittle that once it touches a sample, it becomes instantly blunt and limits the resolution of an AFM and reduces the quality of the image. For softer samples, the tip will damage the sample and also result in inaccuracies of sample height measurements. Consequently, preserving tip integrity enables consistent high resolution and accurate data. True Non-Contact Mode of theXE-AFM superbly preserves the tip, resulting in much longer tip life and less sample damageThe figure, displayed in 1:1 aspect ratio, shows the unprocessed raw data image of a shallow trench isolation sample imaged by the XE-AFM, whose depth is also confirmed by scanning electron microscope (SEM). The same tip used in the imaging of the sample shows no tip wear even after taking 20 images. xe-afm

Park XE7 features

2D Flexure-Guided Scanner with 10 µm x 10 µm Scan Range

xe7 flexure-guide The XY scanner consists of symmetrical 2-dimensional flexure and high-force piezoelectric stacks provides high orthogonal movement with minimal out-of-plane motion as well as high responsiveness essential for precise sample scanning in the nanometer scale. The compact and rigid structure was designed for low noise, high speed servo response.

Flexure-Guided High Force Z Scanner

Driven by a high-force piezoelectric stack and guided by a flexure structure, its rigidity allows it to move at higher speeds in the vertical direction than the scanners used in conventional AFMs. The maximum Z scan range can be extended from 12 µm to 25 µm with the optional long range Z scanner (optional).

Slide-to-Connect SLD Head

The AFM head is easily inserted or removed by sliding it along a dovetail rail. The low coherency of the Super Luminescence Diode (SLD) enables accurate imaging of highly reflective surfaces and precise measurements for pico-Newton Force-distance spectroscopy. The SLD wavelength eliminates interference issues for users interested in combining the AFM with experiments in the visible spectrum.

Accessible Sample Holder

The unique head design can handle up to 100 mm sample size and allows for easy side access to the sample and tip.

Manual XY Sample Stage

The measurement location of the sample is easily and precisely controlled by the manual XY stage. The travel range of the XY sample stage is 13 mm x 13 mm.

Manual Optics Stage
The focus mechanism for the on-axis optics is adjusted manually.
Park XE Control Electronics with DSP Board in Controller
1 1 Controller

The nanoscale signals from the AFM are controlled and processed by the high performance Park XE electronics. With its low noise design and high speed processing unit, Park XE electronics successfully realize True Non-Contact™ mode ideal for nanoscale imaging as well as precise voltage and current measurement.

• High performance processing unit of 600 MHz and 4800 MIPS speed
• Low noise design for precise voltage and current measurement
•  Versatile system to utilize various SPM techniques
•  External Signal Access Module to access AFM input/output signals
•  Maximum 16 data images
•  Maximum data size: 4096 × 4096 pixels
•  ADC/DAC in 16 bit, 500 kHz speed
•  Electric noise isolation from PC by TCP/IP connection


Park XE7 Specifications

XY Scanner

Single-module flexure XY scanner with closed-loop control
Scan range : 100μm x 100μm
                         50μm x 50μm
                         10μm x 10μm


Manual Stage

XY travel range : 13 × 13 mm
Z travel range : 29.5 mm
Focus travel range : 70 mm

Z Scanner range

Guided high-force Z scanner
Scan range : 12 µm
                         15 µm


Sample Mount

Sample size : Up to 100 mm
Thickness : Up to 20 mm



Direct on-axis vision of sample surface and cantilever
Coupled with 10× objective lens (20× optional)
Field-of-view : 480 × 360 µm
CCD : 1 Mpixel




Dedicated system control and data acquisition software
Adjusting feedback parameters in real time
Script-level control through external programs(optional)


AFM data analysis software



High performance DSP : 600 MHz with 4800 MIPS
Maximum 16 data images
Maximum data size : 4096 × 4096 pixels
Signal inputs : 20 channels of 16 bit ADC at 500 kHz samplings
Signal outputs : 21 channels of 16 bit DAC at 500 kHz settling
Synchronous signal : End-of-image, end-of-line, and end-of-pixel TTL signals
Active Q control (optional)
Cantilever spring constant calibration (optional)
CE Compliant
Power : 120 W
Signal Access Module (Optional)


AFM Modes
(*Optionally available)

Standard Imaging

True Non-Contact AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Intermittent (tapping) AFM

Force Measurement*

Force Distance (FD) Spectroscopy
Force Volume Imaging

Dielectric/Piezoelectric Properties*

Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoelectric Force Microscopy (PFM)
PFM with High Voltage

Mechanical Properties*

Force Modulation Microscopy (FMM)
Nanolithography with High Voltage
Piezoelectric Force Microscopy (PFM)

Magnetic Properties*

Magnetic Force Microscopy (MFM)
Tunable MFM

Optical Properties*

Tip-Enhanced Raman Spectroscopy (TERS)
Time-Resolved Photo Current Mapping (PCM)

Electrical Properties*

Conductive AFM
IV Spectroscopy
Scanning Kelvin Probe Microscopy (SKPM/KPM)
SKPM with High Voltage
Scanning Capacitance Microscopy (SCM)
Scanning Spreading-Resistance Microscopy (SSRM)
Scanning Tunneling Microscopy (STM)
Time-Resolved Photo Current Mapping (PCM)

Chemical Properties*

Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-STM and EC-AFM)


Dimensions in mm

xe7 dimension

Park XE7 AFM Options

25 µm Z-scanner Head

Z scan range : 25 µm
Resonant frequency : 1.7 kHz
Laser type : LD (650 nm) or SLD (830 nm)
Noise floor : 0.03 nm (typical), 0.05 nm (maximum)

XE Optical Head

Optical access : top and side
Z scan range : 12 µm or 25 µm
Laser type : LD (650 nm) or SLD (830 nm)
Noise floor : 0.03 nm (typical), 0.05 nm (maximum)
Resonant frequency : 3 kHz (12 µm XE Head), 1.7 kHz (25 µm XE Head)

Magnetic Field Generator

Applies external magnetic field parallel to sample surface
Tunable magnetic field
Range : -300 to +300 gauss, -1500 to +1500 gauss
Composed of pure iron core & two solenoid coils

Clip-type Probehand

Can be used with an unmounted cantilever
Tip bias function available for EFM and Conductive AFM
Tip bias range : -10 V to +10 V
Support all the standard and advanced modes but STM, SCM, and in-liquid imaging

Liquid Cell

• Universal liquid cell
        Open or closed liquid cell with liquid/gas perfusion
        Temperature control range : 4 °C to +110 °C (in air), 4 °C to +70 °C (with liquid)
• Open/closed liquid cell
• Electrochemistry cell

Liquid Probehand

Designed for imaging in general liquid environment
Resistant to most buffer solutions including acid
Contact and Non-contact AFM imaging in liquid

Temperature Control Stages

Type 1 : 0 °C to +180 °C
Type 2 : Ambient to +250 °C
Type 3 : Ambient to +600 °C

Signal Access Module (SAM)

Enables access to various input/output signals for AFM
Scanner driving signal for the XY and Z scanners
Position signal for the XY and Z scanners
Cantilever deflection signals of the vertical/lateral direction
Bias signal for the sample and the cantilever
Driving signal for XE7
Auxiliary input signal to the system


Electrochemistry Cell
Universal Liquid Cell with Temperature Control
Sample Stages with Temperature Control
Magnetic Field Generator


Park AFM Options