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Join us in San Jose, CA from February 26th to March 2nd as SPIE presents the SPIE Advanced Lithography at the San Jose Marriott and San Jose Convention Center! Come to the world's premier lithography event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry. Our applications staff will be on hand to present some of the latest breakthroughs we have made in improving the quality of your research and engineering nanocharacterization experience.


  • Event Dates : February 26th to March 2nd, 2017

  • Venue : San Jose Marriott and San Jose Convention Center — San Jose, CA


About SPIE:

SPIE is an international society advancing an interdisciplinary approach to the science and application of light. The not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.