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Park Systems is a proud official sponsor of the 5th Asia NANO 2010 in Tokyo from November 1st ~3rd. Dr. Sang-il Park, CEO and Chairman of Park Systems, will give an invited talk at the conference, entitled “Advanced Nanotechnology Applications by Crosstalk Eliminated (XE) Atomic Force Microscopy". His presentation will cover one of the latest advancements in AFM industry which has been the Crosstalk Elimination in the XY scan where the XY flexure scanner is decoupled from the Z scanner to which a probe is attached. The design concept of the XE Technology is utilized to support specific advanced nanotechnology applications: a) under-cut measurement by intentionally changing the angle of the Z scanner thereby enabling sidewall roughness characterization in the nanoscale for the first time, and b) polymer pen lithography for low-cost, high throughput nanoscale patterning.Conference attendees will be able to learn the XE-AFM and True Non-Contact Mode which provides unprecedented accuracy and reliability in nanoscale measurement.