ICPT 2018 will be held in the K-Hotel Seoul in South Korea, during October 14-17, 2018.
ICPT (International Conference on Planarization/CMP Technology), is a magnificent opportunity to have discussions on CMP technologies, including FEOL and BEOL CMP, Fundamentals of CMP, Polishing Processes, Consumables, Equipment, 3D/TSV, Metrology, Cleaning, Defect Control, Process Control, etc. The conference provides a place where every relevant researcher and engineer can get together to discuss openly and exchange information widely.
Join us at ICPT 2018 to learn more about our cutting-edge atomic force microscopy solutions for your research and industry application needs. Our innovative AFM technology is expected to be useful information for many researchers.
- Event Dates: October 14(Sun.) - 17(Wed.), 2018. (October 14: Tutorial)
- Venue: The-K Hotel, Seoul, South Korea
- Park’s booth: TBA
About CMP, the background of ICPT
CMP (Chemical mechanical planarization) is a process of smoothing surfaces with the combination of chemical and mechanical forces. It can be thought of as a hybrid of chemical etching and free abrasive polishing.
CMP, as one of the most important processes in the semiconductor manufacturing, has been developed and improved continuously year after year. It has built a certain position in related industries, and is expanding in its applied area. From the user's point of view, technical demand is becoming higher and higher, and additional applications beyond the semiconductor area are increasing.