Park Systems is excited to be participating at this year's North American Molecular Beam Epitaxy Conference (NAMBE) being held from September 18 to 21 at the Gideon Putnam Hotel in Saratoga Springs, NY.
The event is a well-known venue for researchers specializing in molecular beam epitaxy (MBE) and their work to develop new knowledge pathways into the high- and low-volume production of novel materials and devices.
We will be present in the exhibition area answering questions about how our atomic force microscopy (AFM) solutions can complement work performed with MBE and help enable your nanoscale advances.
• Event Dates : September 18 – 21, 2016 (Exhibit: September 19-20)
• Venue : Gideon Putnam Hotel — Saratoga Springs, NY
• Park’s Booth : 13
NAMBE 2016 Floorplan
About NAMBE:
NAMBE is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research.
The conference showcases important results from fundamental materials and device research, through technological applications, and into high-volume and low-cost production. NAMBE features the presentations of the MBE Innovator Award, the NAMBE Young Investigator Award, and the Best Student Paper awards.
In addition to a diverse technical program, vendors will exhibit the latest equipment available for material growth and characterization. The exhibit will surround the coffee breaks and poster presentations, providing many opportunities for discussions between attendees and vendors.
• Link : http://www2.avs.org/conferences/NAMBE/2016/index.htm
