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microscopy and metrology solutions

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Park FX40

Accurion i4

The ultimate stability and accuracy
solution for your scientific research

Park NX20

Accurate Large Sample AFM solution
for research and failure analysis

Park NX-Mask

Repair your most challenging
photomask defects

Park NX-Wafer

Industry's leading automated AFM
for in-line metrology solutions

Emerging Trends of Nanotechnology

Applications

Read the Park systems' Technical Articles about AFM to understand recent developments

Online NanoAcademy

AFM Experts provides you Online Courses, Webinar, Live Demos and Educational Videos from AFM Experts

Scholarship

Park Systems aims to support the next generation of Trail Blazers in Nanoscience by encouraging young researchers to share and discuss their research

The Seventh International SiGe, Ge, & Related Compounds: Materials, Processing, and Devices Symposium is part of the 2016 PRiME Joint International Electrochemical Society Meeting to be held at the Hilton Hawaiian Village Waikiki Beach Resort. This meeting will provide a forum for reviewing and discussing materials and device related aspects of SiGe, Ge, and Related Compounds (eg SiC).

l Event Dates : October 2 – 7 , 2016

l Venue : Hilton Hawaiian Village Waikiki Beach Resort, Honolulu, Hawaii

l Webpage : http://www.sigesymposium.com/ECS_SiGe/Welcome.html

Latest Park News

Park Systems Continues Its Reign as Market Leader in Atomic Force Microscopy

Press-Release | 20 March 2024

Sang-il Park, CEO of Park Systems, Honored with the Esteemed Hanyang Paiknam Prize

Press-Release | 17 October 2023

Park Systems Celebrates Groundbreaking Expansion to Gwacheon and Yongin

Press-Release | 19 September 2023

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Park
FX40

A New Class of Atomic Force Microscope

Park
NX-Mask

Repair your most challenging photomask defects

Accurion
EP4

Thin film characterization imaging ellipsometer nanofilm

Accurion
i4

Compact benchtop isolation table in 3 sizes for versatile use

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The leading innovator of nanoscalemicroscopy and metrology solutions