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Treatment exfoliate alkanes LiBattery Conducting WPlug ULCA FAFailureAnlaysis Fluoride IcelandSpar Pipette dielectric trench China PolymerPatterns DLaTGS tip_bias_mode Corrosion Sio2 TappingMode VortexCore Deposition C36H74 Titanate CuParticle Lateral SmalScan kelvin probe force microscopy Potential Non-ContactMode FrictionalForceMicroscopy GaN HighResolution FrictionForce ElectroChemical Etch
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Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)