-
Titanate Co/Cr/Pt ElectroChemical Biofilm BTO mechanical_property BlockCopolymer UTEM chemical_compound Roughness Floppy Tin disulfide Steps RedBloodCell Optoelectronic CeramicCapacitor Cross-section NTU Temasek_Lab AEAPDES LiftMode Annealed Sio2 hetero_structure Mapping nanomechanical Monisha Mfm lithography Pipette Fiber Bacteria Hexacontane FrictionalForce IMT_Bucharest
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Lithography on Si substrate
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: ContscPt (k=0.2N/m, f=25kHz)
- Scan Size: 10μm×10μm
- Scan Rate: 1Hz
- Pixel: 1024×512
- Litho. mode: Tip bias mode
- Litho. Tip bias: Black -10V, White 0V