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INSP Workfunction bias_mode Vanadate AIN Metal dichalcogenide LateralForce INSPParis VinylAlcohol PetruPoni Fiber DIWafer BismuthFerrite frequency_modulation LFM Leakage Force-distance ScanningSpreadingResistanceMicroscopy ScanningIon-ConductanceMicroscopy Tapping Steps C_AFM nanobar HighResolution KPFM HexacontaneFilm Transparent PS_LDPE conductive MonoLayer hetero_structure semifluorinated alkane Polytetrafluoroethylene phase_change
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Multi-layer necking device defect
Scanning Conditions
- System : NX-Wafer
- Scan Mode: C-AFM
- Scan Rate : 2Hz
- Scan Size : 2μm×2μm
- Pixel Size : 512×256
- Cantilever : AD-2.8-AS (k=2.8N/m, f=75kHz)