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Steps SICM SiliconOxide LDPE Bismuth Silver multi_layer ShenYang oxide_layer CP-AFM SetpointMode Aluminium_Oxide EFM KelvinProbeForceMicroscopy SPMLabs LateralForceMicroscopy Hexatriacontane Granada PetruPoni_Institute ContactModeDot PetruPoni LiftMode Film doped IMT_Bucharest ULCA CeramicCapacitor PS_PVAC Resistance Conduct FailureAnlaysis Roughness mechanical property Vortex hydrocarbon
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Taegeuk Mark Lithography on PZT
Re-arranged the domain pole direction on PZT surface using bias mode of lithography.
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: PPP-ContScPt (k=0.2N/m, f=25kHz)
- Scan Size: 35μm×20μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: 10V for patterned area
- Scan Mode: Lithography
- Cantilever: PPP-ContScPt (k=0.2N/m, f=25kHz)
- Scan Size: 35μm×20μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: 10V for patterned area