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Park Systems Webinar - November 16, 2017

 

 
 

Join us for a webinar to learn about one of the cutting-edge applications of nanoscientific research:


Electrochemical Atomic Force Microscopy (EC-AFM)


    The applications staff of Park Systems is proud to present an introduction to electrochemical atomic force microscopy (EC-AFM), a characterization technique derived from Atomic Force Microscopy (AFM) that that can observe the nanostructures formed on electrode surfaces during electrochemical reactions.

    In EC-AFM, users typically perform voltammetry and corrosion experiments using an electrochemistry cell and a choice of potentiostat or galvanostat depending on the electrochemical application of interest.

    Join us as the Technical Marketing staff at Park Systems, explains the basics of EC-AFM and reviews a multiple cyclic voltammetry experiment involving copper deposition onto a gold sample's surface (and its removal) using a potentiostat, the Park NX10 AFM System, and optional EC Cell.

   
Copper Gold
The webinar will not only give a basic overview of the EC-AFM technique, but will also highlight a basic experiment that can be performed with the Park NX10 AFM System involving the deposition and removal of copper particles on a gold sample electrode surface.

Register by clicking session below:

Thursday, November 16, 2017

ONLINE REGISTRATION PAGE

  • PDT (UTC-7): 11:00 AM - 12:00 PM
  • EDT (UTC -4):  2:00 PM - 3:00 PM 
  • BST (UTC): 7:00 PM - 8:00 PM 
  • CEST (UTC +1): 8:00 PM - 9:00 PM
 

Webinar Details


Date:

Thursday, Nov 16, 2017

Time: 

11:00 am – 12:00 pm (PDT)

San Francisco, Los Angeles

2:00 pm – 3:00 pm (EDT)

Boston, New York

7:00 pm – 8:00 pm (BST)

London

8:00 pm – 9:00 pm (CEST)

Paris, Rome

 

Register Now!

EC Cell


Electrochemistry Cell

The EC Cell from Park Systems is deal for researchers who need to take EC measurements. It features corrosion-resistant PCTFE construction to hold up under heavy use.

Image Credit: Park Systems

 

System Requirements 

GoToWebinar

PC-based attendees

Windows XP, Windows Server 2008 or later 

Mac-based attendees

MacOS 10.8
or later

 

 

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